Product Code: ICA11_N201

Recent Developments in Two-Photon Lithography
Authors:
Tommaso Baldacchini, Technology and Applications Center, Newport Corporation, University of Nebraska-Lincoln; Irvine CA USA
Chun-Hung Kuo, Technology and Applications Center, Newport Corporation; -
Vinicius Tribuzi, Universidade de Sao Paulo; -
Ruben Zadoyan, Technology and Applications Center, Newport Corporation; -
Presented at ICALEO 2011

Two-photon lithohraphy (TPL) is an enabling technology that allows fast prototyping of parts with sub-100 nm resolution. Due to its ability to fabricate microstructures with arbitrary three-dimensional geometries, TPL has been employed in diverse fields such as photonics, microelectronics, microelectromechanical systems, microfluidics, and bioengineering. However, no information is available to date that microscopically correlates the experimental conditions used in TPL with the properties of the ultimate microstructure. A study is presented where the distribution of polymer cross-linking in three-dimensional microstructures fabricated by TPL is visualized by means of nonlinear microscopy. In particular, coherent anti-Stokes Raman scattering (CARS) microscopy is employed to image polymer microstructures with chemical specificity. The characterization of the microstructures based on the acquired images permits rational optimization of the TPP process.