Authors:
Elke A. Bremus-Koebberling
Stefan Beckemper
Fraunhofer Institute for Lasertechnology, Steinbachstr. 15, 52074 Aachen, Germany

Beate Koch


Arnold Gillner
Fraunhofer Institute for Lasertechnology, Steinbachstr. 15, 52074 Aachen, Germany and Chair for Laser Technology, Technical University Aachen, Germany

Laser interference patterning is a versatile tool for the fabrication of nano patterns. For this study, regular nano line patterns with feature sizes between 100 and 1000 nm were produced on polymers polyimide, polyetheretherketone, and polydimethylsiloxane. Cell culture experiments with B35 neuronal cells revealed the alignment of cellular extensions along nano grooves of different feature sizes. Especially, when feature depth exceeds a distinct threshold (aspect ratio > 0.6), more than 50% of cells are oriented parallel, i.e., within angles of 0°–30° to the direction of the line pattern. The presented techniques enable new materials to be processed and offer a promising approach for nerve repair in the central nervous system.