Product Code: ICAL05_M304

Laser-Assisted Imprinting of Self-Assembled Nanostructures
Authors:
Hao Wang, University of Nebraska-Lincoln; Lincoln NE USA
Yongfeng Lu, University of Nebraska-Lincoln; Lincoln NE USA
D.R. Alexander, University of Nebraska-Lincoln; Lincoln NE USA
D.W. Doerr, University of Nebraska-Lincoln; Lincoln NE USA
K. Mendu, University of Nebraska-Lincoln; Lincoln NE USA
Presented at ICALEO 2005

Nanoscale structuring is a promising area in which the easiest and effective processing methods are being developed. Based on the advantage of laser, associated with improved self-assembly technique, it is very effective to fabricate nanoscale structures, such as 3-D photonic bandgap structures, using laser-assisted imprinting method, even on the materials with high hardness and high melting point, such as silicon. This new approach to fabricate 3-D photonic bandgap structures on silicon will be presented. Self-assembly technique was used to deposit multi-layer of silica microparticles with a size of 0.81 �m. A pulsed KrF excimer laser (23ns, 248 nm) was applied as the imprinting energy source.