Product Code: ICAL05_P544

Near-field Nano-molding of Gold Thin Films by a Pulsed Laser
Authors:
Shao Dongbing, The University of Texas at Austin; Austin TX USA
Shefeng Li, The University of Texas at Austin; San Jose CA USA
Shaochen Chen, The University of Texas at Austin; Austin TX USA
Presented at ICALEO 2005

Near-field enhancement around nano-ridges and nano-tips at 532 nm pulsed laser irradiation is utilized to produce sub-wavelength line or dot pattern on gold thin films deposited on glass substrates. The ridges and tips, which have end radii on the order of 50 nm, were fabricated out of silicon dioxide thin film on silicon by micro-fabrication techniques. A 30 nm chromium thin film was evaporated onto the ridges or tips by e-beam evaporation to enhance the near-field effect. Line and dot array were successfully patterned on the Au film with feature size ranging from 100 to 200 nm. Results from numerical simulation using finite difference time domain method agree with experimental results.