Product Code: ICAL07_M1202

Generation of Intense Vacuum Ultraviolet Radiations for Advanced Materials Processing
Authors:
Atushi Yokotani, University of Miyazaki; Miyazaki Japan
Masahito Katto, University of Miyazaki; Miyazaki Japan
Shoichi Kubodera, University of Miyazaki; Miyazaki Japan
Masanori Kaku, University of Miyazaki; Miyazaki Japan
Akira Hosotani, University of Miyazaki; Miyazaki Japan
Noriaki Miyanaga, ILE, Osaka University; Suita Japan
Kunioki Mima, ILE, Osaka University; Suita Japan
Presented at ICALEO 2007

We have been developing high intense vacuum ultraviolet (VUV) radiations for the advanced applications such as micro and precise processing and photochemical reactions. Now, we are proposing and constructing a new VUV laser system to generate output energy of sub mJ with a pulse width of sub-ps at the wavelength of 126nm. A seed pulse will be generated by the 7th-harmonics of 882nm-Ti:sapphire laser and the Ar2 excimer mediums generating by the optical-field-ionization plasma pumped by 780nm TiS laser and also discharge pumped system amplify the radiation. We successfully observed 7th harmonic generation in the Xe gas. The Ar2 excimer generated by the OFI plasma produced a gain of gl=4. Now, the discharge pumped main amplifier is designing and developing.