Product Code: ICAL07_M802

Deposition of the Ni-based Superalloy Films by Pulsed Excimer Laser
Authors:
Joonghan Shin, CLAIM, University of Michigan; Ann Arbor MI USA
Jyoti Mazumder, CLAIM, University of Michigan; Ann Arbor MI USA
Presented at ICALEO 2007

Ni-based superalloy films were deposited on single crystal Ni-based superalloy substrates from the target with congruent alloy components by pulsed laser deposition (PLD) technique. In this study, substrate temperature, pulse energy, pulse repetition rate and deposition time were selected as independent variables to investigate the effect of each process parameter on epitaxial growth behaviour of the Ni superalloy films. Microstructure and growth behaviour of the films deposited under different process parameters were investigated with X-ray diffraction (XRD) and scanning electron microscopy (SEM).