Product Code: ICAL08_N404

Fabrication of Two-layer Integrated Phase Mask and Single-Beam, Single Exposure Fabrication of 3D Photonic Crystal Template using the Mask
Authors:
Yuankun Lin, University of Texas-Pan American; Edinburg TX USA
Ahmad Harb, University of Texas-Pan American; Edinburg TX USA
Daniel Rodriguez, University of Texas-Pan American; Edinburg TX USA
Di Xu, University of Pittsburgh; Pittsburgh PA USA
Karen Lozano, University of Texas-Pan American; Edinburg TX USA
Kevin Chen, University of Pittsburgh; Pittsburgh PA USA
Presented at ICALEO 2008

In this paper, we report the fabrication of two-layer integrated phase mask consisting of two orthogonally oriented gratings. It is made by double exposures of a photoresist to the laser interference pattern. The photoresist is a mixture of photo-sensitive polymer and liquid crystal. The phase separation between the liquid crystal and polymer helps preserve the grating produced during the exposure. Five-beam interference pattern can be generated behind the phase mask. The phase relation among the diffracted beams from the phase mask can be manipulated for the generation of photonic crystal with a large photonic band gap. This lab-made phase mask is demonstrated to be capable of fabricating three-dimensional photonic crystal templates based on single beam, single exposure holographic lithography. This single optical diffractive element based laser holographic lithography can lead to a mass manufacturing of photonic band gap materials.