Product Code: ICAL08_P126

Effect of Annealing Parameters on the Shape Memory Properties of Niti Thin Films
Authors:
Gen Satoh, Columbia University; New York NY USA
Andrew Birnbaum, Columbia University; New York NY USA
Y. Lawrence Yao, Columbia University; New York NY USA
Presented at ICALEO 2008

Sputter deposition was used to deposit amorphous, 1μm thick, Ti-rich NiTi films on silicon substrates which were annealed at various times and temperatures to alter their microstructure. The effects of heat treatments on the shape memory and mechanical properties of the films were analysed through temperature dependent x-ray diffraction and nanoindentation. These heat treatments were shown to affect the transformation temperatures, recovery ratios and hardness of the films and can be used as groundwork for designing laser processes for the fabrication of functionally graded shape memory devices.